The ability of reflected darkfield microscopy to reveal outlines, edges, boundaries, scratches, pinholes and refractive index gradients makes it a valuable imaging technique for materials sciences as well as the semiconductor industry.   However, many commercially available Brightfield/Darkfield (BD) microscope objectives, specifically low magnification, may have significant dark field image intensity roll-off towards the objective periphery.

To address this issue WDI has developed the External Light Diverting Element (ELDE).  This patent pending solution is available as an attachment and may be tailored to the imaging camera photosensitive element type, line scan versus area scan, as well size.

Below are diffuser surface images, acquired with a WDI PFA LN Modular Microscope System (MMS), WDI’s Reflected Darkfield Illuminator and a 2X/0.055NA BD objective.

The left image was acquired without ELDE. The right image was acquired with ELDE which has reduced the dark field image intensity roll off along its diagonal significantly.

Follow this link if you wish to learn more about WDI PFA LN Modular Microscope System (MMS) and WDI’s Reflected Darkfield Illuminator or contact sales@wdidevice.com.